General Information

Purity: 99.95% minimum purity

Size and Shape: Customized Production Or According To The Drawings.

Surface Treatment: CNC lathe

Description

Tantalum sputtering targets is mainly used in integrated circuits and Thin Film Transistor Liquid Crystal Display (TFT-LCD).

Manufacturing Process

Refining

– Multiple step electron beam melting

Grain refinement

– Thermomechanical treatment