CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation
Descrição do produto
CHY-T12100A-3Z4C 1200 degree CVD system for Garaphene Film Preparation CHENGYI CVD System CVD machine price
1.O.D100*1000mm high purity quartz tube
2.High quality ceramic fiber chamber
3.PID Programmable controller
4.Three gas way mass flow controller with precision gas flow controller
5.Two stage Vacuum Pump
5.Made by Henan Chengyi
CHENGYI Laboratory CVD Tube Furnace APPLICATION
1.Laboratory heat thermal processing
2.High Vacuum Sintering Heating Annealing Brazing
3.Laboratory Thin Film Preparation,Nano tube growthing
4.Laboratory CVD system,graphene growthing,preparation.
1200 degree CVD system PARAMETERS
Product Name 1200 degree CVD Furnace
Modle No. CHY-T12100A-3Z4C
Heating zones Single heating zone
Heating zone length 400mm
Constant temperature zone length 200mm
Tube Material high purity quartz tube
Tube diameter O.D100*I.D94*1000mm Quartz Tube
Tube Length 1000mm,750mm,1000mm,1200mm as enquiry
Thermcouple K type
Maximum heating temper 1150 dgree
Heating rate 20c/min,adjustable suggestion 10 degree/min
Heating element Fe-Co-Al by Mo alloy
Sealing Method stainless steel vacuum flange
Vacuum Air-tightness 9.8×10-4Pa
Temperature Accuracy ±1℃
Control Mode Intelligent PID programmable Control,30 steps sintering curve restore
Mass Flow Controller 3 gas way mass flow controller
Flowmeter Core 304 stainless steel
Measure Accuracy +/- 1.0% F.S
Pressure Range -0.1~0.15MPa
A way gas range 0~100SCCM
B way gas range 0~200SCCM
C way gas range 0~500SCCM,or as customized
Vacuum Pump 4C
Power Supply AC220V 50Hz
Our CVD machine has three gas way mass flow controller with precision gas flow controller. Our products are very popular, please contact us as soon as possible!
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